How can I design a rectangular piece of Silicon with n = 300cm^-3 at T = 300K?

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In summary, the conversation discussed designing a rectangular piece of silicon with a specific electron density of n = 300cm^-3 at T = 300K. The formula n*p = ni^2 was used, with the given values of Eg = 1.12eV, k = 1.38x10^-23, and ni = 5.2 × 1015T3/2 e^(−Eg/2kT) electrons/cm^3, to determine the value of p. The relevance of the size of the piece was questioned, as the electron density is independent of the size. It was later discovered that the professor was simply asking about the process of doping to achieve the desired n and p values
  • #1
bryand130
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Design a rectangular bpiece of Silicon with n = 300cm^-3 at T = 300K. Be specific and quantitative



n*p = ni^2
ni = 5.2 × 1015T3/2 e^(−Eg/2kT) electrons/cm^3




Using the formula above, with Eg = 1.12eV = 1.792x10^-19 J, and k = 1.38x10^-23
i get ni = 1.0776x10^10 electrons/cm^3
Using the formula n*p = ni^2, i solved for p = 3.87x10^17


As far as where to go next, I'm unsure. I sent a message to my prof. asking what exactly he wants for this question, but I haven't received a response yet. Would it be even feasible to attempt to get dimensions for a solid using just these values?
 
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  • #2
Your p needs units.
I don't see how the size would be relevant here, unless there is something missing in the problem statement. You have to get a certain electron density, and this is independent of the size.
 
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  • #3
mfb said:
You p needs units.
I don't see how the size would be relevant here, unless there is something missing in the problem statement. You have to get a certain electron density, and this is independent of the size.

I got a message back from the prof. Turns out he was mostly just wanting to know what process would be used to actually make a piece of Si with n and p such as this. Essentially, he just wants to know what process of doping I would use. Oh well, I was pulling my hair out for nothing.
 

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