K X-Ray Production in PIXE: 2 MeV vs. 4 MeV

In summary: So increasing the energy will cause the cross section for atom b to increase more then the cross section for atom a.
  • #1
Silviu
624
11

Homework Statement


In PIXE (Proton-Induced X ray Emission), if you increase the beam energy from 2 MeV to 4 MeV, do you expect that the factor of increase in the cross section for the K X ray production from Ni is higher than that from S, or vice-versa?

Homework Equations

The Attempt at a Solution


The professor didn't give us any equation, just a conceptual explanation of the process. It makes sense that the cross section increases with the energy of the incident particle but I am not sure how this increase depends on different elements. So I am not sure how to approach this problem. Any idea?
 
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  • #2
Which atom has more electrons that can make the transition ## h\nu_{x-ray}##?
 
  • #3
Fred Wright said:
Which atom has more electrons that can make the transition ## h\nu_{x-ray}##?
Hello! I guess the one with more electrons has a higher cross section. My question was more how do you calculate the change in the ratio of the cross sections. Like if the cross section of the one with more electrons is a and for the other one is b, when the energy is 2 MeV, of course when you go to 4 MeV the one with more electrons will still have a higher cross section, but I am not sure what happens to the ratio ##\frac{a}{b}## because the ration can both increase or decrease while its value to be greater than 1
 
  • #4
If atom a has much fewer electrons which can be ionized, increasing the energy will have a smaller effect on the observed crossection.You observe a certain prosecution for atom a at 2 Mev but increasing the energy will not have much of an effect because all of it's electrons were ionized at the lower energy. Where as atom b still has electrons which can be ionized at the higher energy.
 

FAQ: K X-Ray Production in PIXE: 2 MeV vs. 4 MeV

What is PIXE?

PIXE (Particle-Induced X-Ray Emission) is a technique used in analytical chemistry and materials science to determine the elemental composition of a sample. It involves bombarding a sample with high-energy particles, such as protons or alpha particles, which then cause the emission of characteristic X-rays from the elements present in the sample.

What is K X-Ray Production?

K X-rays are a type of X-ray emission that occurs when an electron from a higher energy level in an atom drops down to fill a vacancy in the K-shell (the innermost electron shell). This process results in the emission of a characteristic X-ray with a specific energy level that is unique to the element.

What is the difference between 2 MeV and 4 MeV in PIXE?

The numbers 2 MeV and 4 MeV refer to the energy level of the particles used in the PIXE technique. 2 MeV (mega electron volts) refers to particles with an energy of 2 million electron volts, while 4 MeV refers to particles with an energy of 4 million electron volts. The higher the energy of the particles, the deeper they can penetrate into a sample, resulting in a higher sensitivity for detection of elements present in deeper layers of the sample.

Why is it important to compare 2 MeV and 4 MeV in PIXE?

It is important to compare different energy levels in PIXE because the choice of energy level can affect the sensitivity and accuracy of the analysis. Lower energy levels may be more suitable for analyzing surface layers of a sample, while higher energy levels may be needed for deeper layers. By comparing 2 MeV and 4 MeV, we can determine which energy level is best for detecting specific elements in a sample.

What are the limitations of using 2 MeV and 4 MeV in PIXE?

One limitation of using 2 MeV and 4 MeV in PIXE is that they may not be suitable for detecting elements with very low concentrations in a sample. Additionally, higher energy levels can cause more radiation damage to the sample, which may affect the accuracy of the results. It is important to carefully consider the energy level used in PIXE to ensure optimal results for a specific sample.

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