Linearly graded pn junctions

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In summary, to calculate Emax, Vbi, W, and the junction capacitance of a linearly graded pn-junction with given doping conditions, you can use the Shockley equation to find Xo, and then use the equations Emax = Vbi/(2*Xo), W = 2*Xo, and Cj = epsilon0 * A/Xo to calculate the values. The Shockley equation relates Vbi and Xo, and the other equations use these values to calculate the remaining parameters.
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kn336a
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Hi, my question is:

Given a linearly graded on-junction with the following doping conditions a=10^21

I have to calculate Emax, Vbi, W and the junction capacitance with Va=0.2V and Vr=-5V

This is for Silicon @ T=300k

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From what I understand, I have to use an iterative method but I don't think I'm getting the correct answer.

I'm using this equation Vbi=Vt*ln((a*Xo)/(ni))^2


Vt=0.0259
ni=1.5x10^10
a=10^21

where Xo= depletion region width

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Since I'm not given Vbi or Xo, I tried using an iterative method and Vbi and Xo converge at 20.202

I'm not quite sure what to do with this number or which value it pertains to. I would make the assumption that the potential barrier would be around 0.65-0.7V

Can anyone lead me to the right direction? Thanks.
 
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To answer your question, you need to use the Shockley equation. This equation relates the depletion region width (Xo) and the built-in potential barrier (Vbi) of a pn junction at equilibrium. The equation is Vbi = Vt * ln[(a*Xo)/ni], where Vt is the thermal voltage (kT/q), a is the doping concentration of the p-type material, Xo is the depletion region width, and ni is the intrinsic carrier concentration. Once you solve for Xo, you can calculate the maximum electric field (Emax) using Emax = Vbi/(2*Xo), W is the depletion region width (Xo), and the junction capacitance using Cj = epsilon0 * A/Xo. You can also use the following equations to calculate Vbi, W, and the junction capacitance: Vbi = Vr + Va W = 2 * Xo Cj = epsilon0 * A/Xo where Vr and Va are the reverse and forward bias voltages respectively, A is the area of the junction, and epsilon0 is the permittivity of free space.
 

FAQ: Linearly graded pn junctions

What is a linearly graded pn junction?

A linearly graded pn junction is a type of semiconductor junction where the doping concentration gradually changes from one type of semiconductor material to another. In this type of junction, the concentration of impurities is highest at one end and decreases linearly towards the other end.

What is the purpose of a linearly graded pn junction?

The purpose of a linearly graded pn junction is to create a smooth transition between two different types of semiconductor materials. This helps to reduce the formation of defects and minimize the potential barrier at the junction, allowing for better electron flow and improved device performance.

How is a linearly graded pn junction formed?

A linearly graded pn junction is formed through a process called diffusion. This involves introducing impurities, such as phosphorus or boron, into a semiconductor material through a high-temperature process. The impurities diffuse into the material, creating a gradual change in doping concentration.

What are the advantages of using a linearly graded pn junction?

Linearly graded pn junctions offer several advantages, including reduced potential barrier at the junction, improved electron flow, and less formation of defects. These properties make them useful in high-frequency devices, such as microwave transistors, and in power devices, such as solar cells.

What are the potential drawbacks of linearly graded pn junctions?

One potential drawback of linearly graded pn junctions is their complexity and cost of production. They also have a limited range of applications, as their properties are mainly beneficial in certain types of devices. Additionally, the linear doping profile may not be suitable for some specific device requirements.

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