- #1
mendes
- 40
- 0
how can we understand it please ? Thanks.
mendes said:how can we understand it please ? Thanks.
berkeman said:Can you please provide some context and background for your question? What do you know so far?
http://www.google.com/search?source...02&q=metastable+deep+defect+in+semiconductors
.
caffenta said:When the deep level is excited, it changes the local electronic structure of the defect; bonds break and there is a shift in the local lattice structure (relaxation). That gives rise to a new shallow defect (for example). There is an energy barrier that prevents the return to the original deep level configuration. If the temperature is too low, the energy barrier is not overcome, so the new shallow defect is "stable". This is why photoconductivity persists even after the light is turned off. When the sample is warmed up, the barrier is overcome and the defect returns to its original deep level configuration, trapping the electron and persistent photoconductivity stops.
In my earlier post, I had linked to a paper that had a good explanation of the mechanism, but after consulting with mentors, I decided to remove it because it was a copyrighted paper. If you have access to the journal, this is the reference: D. J. Chadi, K. J. Chang, Phys. Rev. B, 39(14), 10063 (1989).
Do a search on DX centers or EL2 defects on Google. You can find lots of info on the mechanism.
caffenta said:The barrier is related to the structural shift that needs to occur to go from metastable to original configuration. If an electron drops into the metastable shallow state, it will not be trapped into the deep level unless the structural shift happens. Otherwise, it will just be re-excited thermally into the conduction band eventually.
The attached picture should explain a lot (including the second question).
A metastable deep defect in semiconductors is a type of imperfection or impurity that can occur within a semiconductor material. These defects can significantly impact the electrical and optical properties of the semiconductor and are often a major focus of study in the field of semiconductor physics.
Metastable deep defects can form in semiconductors through a variety of processes, such as crystal growth, ion implantation, or exposure to radiation. These defects can also be introduced intentionally during the manufacturing process to control the electrical properties of the semiconductor material.
The presence of metastable deep defects in a semiconductor can lead to changes in the material's electrical conductivity, bandgap, and recombination rates. This can result in a decrease in device performance and reliability, making it crucial for scientists to understand and mitigate these defects.
Scientists use a variety of techniques to study metastable deep defects in semiconductors, such as deep level transient spectroscopy, photoluminescence spectroscopy, and capacitance-voltage measurements. These techniques allow for the characterization and identification of specific defects and their properties.
While it is not always possible to completely eliminate metastable deep defects in semiconductors, researchers are constantly working to develop new methods for controlling and reducing their impact. This can include techniques such as annealing, passivation, or the use of different materials to reduce defect formation during crystal growth.