Thanks.TeethWhitener said:Karl Christe famously did this in 1986:
http://pubs.acs.org/doi/abs/10.1021/ic00241a001
His synthesis involves abstraction of two F- anions from MnF62- using two equivalents of the "fluorophile" SbF5. The stroke of genius here is that Christe recognized that MnF4 is thermodynamically unstable and decomposes into the stable MnF3 and F2 gas.
lightarrow said:Which is the exact reaction involving the oxidation of HF?
Unfortunately I haven't access to that document. Would you please write them here?willem2 said:Reactions 3,4 and 5 from the article
Yes, I can see it now, with the PC. With the smartphone I can't, don't know why.DrDu said:You should at least see the first ppage of this article which contains all the formulas.
Thanks.TeethWhitener said:
HF can be oxidized to F2 using various chemicals, such as fluorine, chlorine, bromine, or potassium permanganate. These chemicals act as oxidizing agents and react with HF to produce F2. The specific method and conditions for this reaction may vary depending on the chosen chemical.
Oxidizing HF to F2 is important because it allows us to obtain a more reactive and useful chemical. F2 is widely used in industrial processes, such as producing refrigerants, pesticides, and fluorine-containing compounds. It also has applications in the production of electronics and pharmaceuticals.
There are several potential risks associated with this process, including the toxicity and corrosiveness of both HF and F2. The use of strong oxidizing agents also poses a fire hazard. It is important to handle these chemicals with caution and follow proper safety protocols to minimize the risks.
There are other methods of oxidizing HF to F2, such as using electricity or high temperatures. However, these methods may not be as efficient or practical as using chemicals. Additionally, they may also pose their own safety risks. Therefore, using chemicals is often the preferred method for oxidizing HF to F2.
In addition to industrial uses, oxidizing HF to F2 can also be used in laboratory experiments and research. It can also be used in the production of specialized chemicals, such as fluorine gas, which is used in the etching of silicon wafers for electronics. Furthermore, the reaction itself can be studied to better understand the properties and behavior of fluorine and HF compounds.