Why are dots and lines useful for EBL?

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In summary, the conversation discusses the use of lines and dots in Electron Beam Lithography (EBL) and whether they are useful in the writing process. It is mentioned that EBL has a limitation of sub-10 nanometers and that line and dot features smaller than this limit may not make sense. The conversation also touches on different software and file formats used in EBL and how they may affect the use of lines and dots. Ultimately, the usefulness of lines and dots in EBL depends on the software and specific process being used.
  • #1
Yinxiao Li
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Hi all, I am new to here and also new to EBL. I believe Electron Beam Lithography has a limit of sub-10 nms. Today when I draw a CAD file, I saw other than area, we can also draw line and dots. That doesn't make sense since there is a limitation on feature size and line width has to be at least bigger than that limit.
Is line and dot really useful in EBL writing?
 
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  • #2
I am not sure what you are asking.
What do you mean by "dots" and "lines"?
It depends on the software and file format you are using, some people draw their masks using CAD software, saves it as DXF and then convert to GDS. If that procedure is used some converters will assume all closed polylines to be part of the pattern, and everything else "controls" the EBL. A good example would be to use different colours for dose modulation.
However, if you are using software specially made for lithography (say L-Edit), then lines and dots smaller than the minimum feature size make no sense unless they are just there as drawing aids and are removed before the mask is made.
 

FAQ: Why are dots and lines useful for EBL?

Why are dots and lines used in EBL?

Dots and lines are used in EBL (Electron Beam Lithography) because they are the basic building blocks of creating patterns and designs on a surface. These patterns and designs are essential for the fabrication of micro-electronic devices and circuits.

How are dots and lines created in EBL?

In EBL, dots and lines are created using a focused electron beam to selectively expose a resist material on a surface. The resist material is then developed, revealing the desired pattern of dots and lines.

What are the advantages of using dots and lines in EBL?

Dots and lines have several advantages in EBL. They allow for precise control of pattern dimensions, high resolution, and the ability to create complex and intricate designs. Additionally, using dots and lines allows for efficient use of space on a surface, making it ideal for creating small-scale devices.

Can dots and lines be used for other applications besides EBL?

Yes, dots and lines are used in various other applications besides EBL. They are commonly used in printing, graphic design, and computer graphics. In science and engineering, they are also used for data visualization and analysis.

Are there any limitations to using dots and lines in EBL?

While dots and lines are highly versatile and useful in EBL, they do have some limitations. They are limited in their ability to create curved or angled structures, and the process can be time-consuming and costly. Additionally, the resolution of dots and lines is limited by the size of the electron beam used.

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